VACUUM DEPOSITION SYSTEM AND VACUUM DEPOSITION METHOD

摘要

The present invention aims to provide a technology which uses an apparatus having a simple configuration to efficiently form a film with uniform film thickness and film properties, when continuously forming a film using highly reactive lithium by vacuum deposition. The present invention is a vacuum deposition system comprising a vacuum deposition chamber 2 wherein an evaporation material 10 is deposited on a substrate 50 by deposition, a substrate supplying/replacing system 3 connected to the vacuum deposition chamber 2 for performing supplying and replacing the substrate 50 to and from the vacuum deposition chamber 2, and a material supplying/replacing system 4 connected to the vacuum deposition chamber 2 for performing supplying and replacing the evaporation material 10 to and from the vacuum deposition chamber 2. The material supplying/replacing system 4 is provided with a material loading chamber 45 in which the evaporation material 10 is disposed in an evaporation container 7 in an atmosphere that is blocked off to ambient air and a material replacing chamber 43 in which the evaporation container 7 is transported to and from the vacuum deposition chamber 2. A heater 22 for heating the evaporation container 7 supplied from the material supplying/replacing system 4 is provided within the vacuum deposition chamber 2.
The present invention aims to provide a technology which uses an apparatus having a simple configuration to efficiently form a film with uniform film thickness and film quality, when continuously forming a film by vacuum deposition of highly reactive lithium. A vacuum deposition system of the present invention has a vacuum deposition chamber wherein an evaporation material is deposited on a substrate by deposition, a substrate supplying/replacing system, connected to the vacuum deposition chamber, for performing supplying and replacing the substrate to and from the vacuum deposition chamber, and a material supplying/replacing system, connected to the vacuum deposition chamber, for performing supplying and replacing the evaporation material to and from the vacuum deposition chamber. The material supplying/replacing system has a material loading chamber in which the evaporation material is disposed inside an evaporation container in an atmosphere blocked off to ambient air and a material replacing chamber where the evaporation container is transported to and from the vacuum deposition chamber. A heater for heating the evaporation container supplied from the material supplying/replacing system is provided within the vacuum deposition chamber.