发明名称 |
Method of manufacturing photomask |
摘要 |
A method of manufacturing a photomask, according to the present invention, comprises the step of entirely forming an intermediate shifter on a transparent substrate, light shielding layers and a phase shifter such that the thickness of the intermediate shifter successively varies. In edge portion of the phase shifter, thus, the phase of light is continuosly shifted from 0 to 180 degree. As in result, light intensity at the edge portion does not decrease to zero but has a relatively large value, preventing a bridge to be formed.
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申请公布号 |
US5254418(A) |
申请公布日期 |
1993.10.19 |
申请号 |
US19910777189 |
申请日期 |
1991.10.16 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
KAMON, KAZUYA;MIYAZAKI, JUNJI;NAGATA, HITOSHI |
分类号 |
G03F1/00;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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