Lateral connection for a via-less thin film resistor and method of forming the same

摘要

The present disclosure is directed to an integrated circuit (100) having a substrate (108) and a first and a second interconnect structure (104a,b) over the substrate. Each interconnect structure has a first conductive layer (106) over the substrate and a second conductive layer (124) over the first conductive layer. The integrated circuit also includes a thin film resistor (102) over a portion of the substrate between the first and the second interconnect structure that electrically connects the first conductive layers of the first and second interconnect structures.