| 摘要 |
The polishing apparatus (10) comprises: a polishing head (14) for holding a work (30); a polishing plate (12) having a polishing face; and a driving mechanism for relatively moving the polishing head (14) with respect to the polishing plate (12). The polishing head (14) includes: a holding plate (22); an elastic sheet member (28) being fixed to the holding plate (22), the elastic sheet member (28) having a lower face for pressing the work (30) onto the polishing plate (12); a pressure chamber, to which a pressure fluid is supplied, being formed between the holding plate (22) and the elastic sheet member (28); a seal ring (36) concentrically dividing the pressure chamber into chambers (40, 42), the seal ring (36) having a seal lip (38); and a fluid supply section (29, etc.) for individually supplying the fluid to the divided chambers (40, 42). |
