Resist composition, method of forming resist pattern, novel compound, and acid generator

摘要

A compound represented by general formula (I); and a compound represented by general formula (b1-1). wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an—SO2—bond in the structure thereof; M+ represents an alkali metal ion; and A+ represents an organic cation.