| 摘要 |
<p>A low irritancy cleansing composition comprises: (a) an anionic surfactant compound of formula (I): wherein R1 represents a C4-36 substituted or unsubstituted hydrocarbyl group; each of R2, R3, R4 and R5 independently represents a hydrogen atom or a C1-4 alkyl group and wherein at least one of R2, R3, R4 and R5 is not hydrogen and M+ represents a cation; and (b) an amphoteric surfactant; wherein the molar ratio of component (a) to component (b) is from 0.25:1 to 4:1 and wherein the composition comprises less than 3 wt% polyethoxylated non-ionic species.</p> |
