发明名称 Double trench rectifier
摘要 A high power density or low forward voltage rectifier which utilizes at least one trench in both the anode and cathode. The trenches are formed in opposing surfaces of the substrate, to increase the junction surface area per unit surface area of the semiconductor die. This structure allows for increased current loads without increased horizontal die space. The increased current handling capability allows for the rectifier to operate at lower forward voltages. Furthermore, the present structure provides for increased substrate usage by up to 30 percent.
申请公布号 US8125056(B2) 申请公布日期 2012.02.28
申请号 US20090565201 申请日期 2009.09.23
申请人 TSAI HUNG-PING;CHEN SHIH-KUAN;KAO LUNG-CHING;VISHAY GENERAL SEMICONDUCTOR, LLC 发明人 TSAI HUNG-PING;CHEN SHIH-KUAN;KAO LUNG-CHING
分类号 H01L29/06 主分类号 H01L29/06
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