APPARATUS AND METHOD OF DETECTING BY-PRODUCT ON ETCHED SURFACE OF SEMICONDUCTOR USING ELECTROCHEMICAL REACTION

摘要

PURPOSE: An etching by-product detecting apparatus and method are provided to detect an etching by-product by applying potential to a working electrode and measuring a current in potentiostat. CONSTITUTION: A working electrode(103) comprises a first conductive region and a second conductive region. The working electrode prepares a detection object semiconductor having working side in the one of the first conductive region and the second conductive region. A potentiostat(101) is connected to the working electrode and applies variable potential in the working electrode and measures a current according to the variable potential. A counter electrode is connected to the potentiostat. A electrolyte(107) is connected to the counter electrode and is electrically connected to the second region of the detection object semiconductor.