发明名称 |
SOLUTION BASED PRECURSORS |
摘要 |
<p>Solution-based precursors for use as starting materials in film deposition processes, such as atomic layer deposition, chemical vapor deposition and metalorganic chemical vapor deposition. The solution-based precursors allow for the use of otherwise solid precursors that would be unsuitable for vapor phase deposition processes because of their tendency to decompose and solidify during vaporization.</p> |
申请公布号 |
SG177399(A1) |
申请公布日期 |
2012.02.28 |
申请号 |
SG20110096856 |
申请日期 |
2010.07.01 |
申请人 |
LINDE AKTIENGESELLSCHAFT |
发明人 |
MA, CE;KIM, KEE-CHAN;MCFARLANE, GRAHAM, ANTHONY |
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