SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A substrate processing apparatus is provided to maintain the hydrogen peroxide concentration of a compound chemical solution by supplying a nozzle unit discharging the compound chemical solution. CONSTITUTION: A recovery member(810) comprises a collection supply line(812), a collection tank(814), and a reuse supply line(816). A drug solution source part(820) is composed of a first drug solution source part(820a) and a second drug solution source part(820b). A first feeding unit(830) comprises a first tank(832) and a first concatenated line(834). A second feeding unit(850) comprises a second tank(852) and a second connection line(854). A main feeding unit(870) comprises a main tank(872) and a preheat member for preheating the main tank.