APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

摘要

PURPOSE: An apparatus and a method for processing a substrate are provided to improve a processing efficiency by reducing a time requiring for processing a substrate by processing a target area in a detected substrate. CONSTITUTION: An align unit(20) aligns a substrate to determine the position thereof. The align unit comprises a plurality of support members supporting the both sides of the substrate and also includes a transport unit. The transport unit transfers the support members to be close to each other or separated from each other. A support member(211) pressing the both sides of the substrate is formed in the support member. A detecting unit(30) detects the location of a target region of the substrate. A processing unit processes the target region which is detected by the detection unit.