发明名称 |
MOULE POUR LA LITHOGRAPHIE PAR NANO-IMPRESSION ASSISTEE UV ET PROCEDES DE REALISATION D'UN TEL MOULE |
摘要 |
The mold (1) has a first flexible or rigid material layer (5) with a second rigid material layer (15) in which structured areas (30) are realized, and with a third opaque and rigid material layer (2) in which recesses are formed in opposite of the areas. The recesses are filled with flexible material to form portions (4). Transmittances of the three layers with determined wavelength are defined such that transmission of luminous of the determined wavelength via the layers is less than transmission of luminous of the determined wavelength via any of the portions and the first and second layers. An independent claim is also included for a method for realizing a mold. |
申请公布号 |
FR2955522(B1) |
申请公布日期 |
2012.02.24 |
申请号 |
FR20100050570 |
申请日期 |
2010.01.28 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
LANDIS STEFAN |
分类号 |
B29C33/42;B29C33/38;B81C99/00;G03F7/20 |
主分类号 |
B29C33/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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