PURPOSE: A desmear plasma processing chamber for a semiconductor substrate is provided to reduce failure rate and to improve processing efficiency by including a ceramic panel and a magnetic bar and offering stable plasma. CONSTITUTION: A pair of ceramics holding fixtures(41) is fixed to the inner wall of a chamber body. An aluminum panel(42) interlinks a pair of ceramics holding fixtures. A plurality of magnetic bars(43) is installed in one side of the aluminum panel. A ceramic panel(44) interlinks a plurality of magnetic bars. An electrode part(45) is installed in one side of the ceramic panel. A gas supply apparatus is installed in the inner side of the chamber body. The gas supply apparatus is composed of a spraying nozzle and a supply pump which supplies reacting gas to the spraying nozzle.
