发明名称 MICROLENS EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a microlens exposure device in which a microlens array and a mask are fixed at predetermined intervals, which can easily and correctly adjust the gap between the microlens array and an exposure substrate at the focal position of the microlens. <P>SOLUTION: Exposure laser light is delivered onto a resist film 2 through a microlens 3a of a microlens array 3. Light from a microscope 10 transmits through a hole 5b of a Cr film 5 of a mask 4 and is delivered onto the resist film 2 through a microlens 3b. The observation with the microscope 10 to determine whether the light having passed through this microlens 3b is focused on the resist film 2 or not, can determine the focal point of the exposure light converged on the resist film 2 by the microlens 3a. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012038927(A) 申请公布日期 2012.02.23
申请号 JP20100177873 申请日期 2010.08.06
申请人 V TECHNOLOGY CO LTD 发明人
分类号 H01L21/027;G02B3/00;G02B7/00;G03F7/20 主分类号 H01L21/027
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