| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress intrusion and generation of foreign matter in a closed space formed by a mask, a pellicle frame and a pellicle film in a photomask. <P>SOLUTION: The photomask has a mask 1, a pellicle frame 2 which is arranged on the mask 1 and has a predetermined height, and a pellicle film 3 provided on the pellicle frame 2 facing the mask 1. The pellicle film 3 forms the closed space with the mask 1 and the pellicle frame 2. The pellicle frame 2 has a vent hole which connects the inside and outside of the closed space, with irregularities on the inner wall of the vent hole. <P>COPYRIGHT: (C)2012,JPO&INPIT |
