| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mold for nanoimprinting which can make compatible both the suppression of a height of a bur generated when forming a fine pattern and the suppression of the contact of a mold base with a resin when pressing a pattern surface to the resin. <P>SOLUTION: A mold 1a includes a mold base 3 and a mold body 5. A surface 5S of the mold body 5 includes a pattern surface 5S1 where a pattern 5P for nanoimprinting is formed and a sub-surface 5S2 formed along outer edges 5S1X, 5S1Y of the pattern surface 5S1. A longest distance H5S2 from the sub-surface 5S2 to the surface 3S of the mold base 3 in a direction perpendicular to the surface 3S is shorter than a distance H5S1 from the pattern surface 5S1 to the surface 3S of the mold base 3 in a direction perpendicular to the surface 3S of the mold base 3, and the difference D5S is larger than the depth of the pattern 5P for nanoimprinting. <P>COPYRIGHT: (C)2012,JPO&INPIT |
