A chamber optimized for drying a substrate is provided. The chamber includes opposing sidewalls having fluid channels extending therethrough. The fluid channels deliver a fluid to interior inlet ports of the chamber. Outlet ports positioned below corresponding interior inlet ports are in communication with a vacuum source in one embodiment. A loop flow path extending into the interior of the chamber from opposing sides is provided. The loop flow path is swept across the interior of the chamber by alternating the fluid flow from the inlet ports or outlet ports.
申请公布号
WO2011126926(A3)
申请公布日期
2012.02.23
申请号
WO2011US30816
申请日期
2011.03.31
申请人
XYRATEX TECHNOLOGY LTD.;MILLER, KENNETH, C.;KAZEMI, MOHAMMAD