发明名称 |
TEXTURE-FORMING COMPOSITION, METHOD FOR PRODUCING SILICON SUBSTRATE, AND KIT FOR PREPARING TEXTURE-FORMING COMPOSITION |
摘要 |
<p>Provided is a texture-forming composition which is not required to be strictly controlled with respect to the liquid composition thereof and is capable of producing a silicon substrate having a surface morphology (relief structure) with reduced unevenness and having further reduced light reflectance. The texture-forming composition is characterized by containing 0.3-15 parts by mass inclusive of a base with respect to 100 parts by mass of water, and further containing an alkylsulfonate anion represented by formula (1) (wherein R is an alkyl group having 3 to 12 carbon atoms).</p> |
申请公布号 |
WO2012023613(A1) |
申请公布日期 |
2012.02.23 |
申请号 |
WO2011JP68792 |
申请日期 |
2011.08.19 |
申请人 |
TOKUYAMA CORPORATION;YATABE, OSAMU;MURATA, AKIKO;HITOMI, TATSUYA |
发明人 |
YATABE, OSAMU;MURATA, AKIKO;HITOMI, TATSUYA |
分类号 |
H01L21/308;H01L31/04 |
主分类号 |
H01L21/308 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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