发明名称 TEXTURE-FORMING COMPOSITION, METHOD FOR PRODUCING SILICON SUBSTRATE, AND KIT FOR PREPARING TEXTURE-FORMING COMPOSITION
摘要 <p>Provided is a texture-forming composition which is not required to be strictly controlled with respect to the liquid composition thereof and is capable of producing a silicon substrate having a surface morphology (relief structure) with reduced unevenness and having further reduced light reflectance. The texture-forming composition is characterized by containing 0.3-15 parts by mass inclusive of a base with respect to 100 parts by mass of water, and further containing an alkylsulfonate anion represented by formula (1) (wherein R is an alkyl group having 3 to 12 carbon atoms).</p>
申请公布号 WO2012023613(A1) 申请公布日期 2012.02.23
申请号 WO2011JP68792 申请日期 2011.08.19
申请人 TOKUYAMA CORPORATION;YATABE, OSAMU;MURATA, AKIKO;HITOMI, TATSUYA 发明人 YATABE, OSAMU;MURATA, AKIKO;HITOMI, TATSUYA
分类号 H01L21/308;H01L31/04 主分类号 H01L21/308
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