发明名称 RADIATION-SENSITIVE COMPOSITION, PROTECTIVE COAT, AND INTERLAYER DIELECTRIC, AND METHOD OF FORMING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a polysiloxane-based negative-type radiation-sensitive composition with a sufficient resolution which is suitable to form a protective coat and an interlayer dielectric that are excellent in transparency, heat resistance (heat-resistant transparency), sensitivity, refractive index, surface hardness, scratch resistance, adhesion to an ITO transparent conductive film, and crack resistance, and to provide the protective coat and the interlayer dielectric formed of the composition, as well as to provide a method of forming the protective coat and the interlayer dielectric. <P>SOLUTION: The invention includes: [A](a1) a hydrolyzed condensate obtained by reaction between a hydrolyzable silane compound represented by the formula (1) and a hydrolyzable silane compound represented by the formula (2); [B] a radiation-sensitive acid generator or a radiation-sensitive base generator; and [C] a radiation-sensitive composition containing an alcohol solvent. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012037866(A) 申请公布日期 2012.02.23
申请号 JP20110118005 申请日期 2011.05.26
申请人 JSR CORP 发明人
分类号 G03F7/075;C08G77/18;G03F7/004;H01L21/027 主分类号 G03F7/075
代理机构 代理人
主权项
地址