| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus which can generate plasma stably in a discharge chamber by preventing generation of reflection wave and plasma in a converter with a light-weight, compact and simple structure. <P>SOLUTION: The vacuum processing apparatus comprises a discharge chamber 2 comprising a ridge waveguide having ridge electrodes 21a, 21b for discharge which face in parallel each other with a substrate S being subjected to plasma processing arranged therebetween, converters 3A, 3B comprising ridge waveguides having a pair of planar ridges 31a, 31b which face in parallel each other and are contiguous to the opposite ends of the discharge chamber 2 in the length direction, high frequency power supplies 5A, 5B, coaxial cables 4A, 4B for connection with power supply, and a filler 35 filling the space between the ridges 31a, 31b facing each other in the converters 3A, 3B. The filler 35 is installed cylindrically and concentrically to a power supply introduction section C where the coaxial cables 4A, 4B are connected to the converters 3A, 3B within a range in the neighborhood of the power supply introduction section C. <P>COPYRIGHT: (C)2012,JPO&INPIT |
