发明名称 |
THIN FILMS MEASUREMENT METHOD AND SYSTEM |
摘要 |
A method and system are provided for controlling processing of a structure. First measured data is provided being indicative of at least one of: a thickness (d2) of at least one layer (L2) of the structure W in at least selected sites of the structure prior to processing of the structure, and a surface profile of the structure prior to processing. An optical measurement is applied to at least the selected sites of the structure after processing and second measured data is generated being indicative of at least one of: a thickness of the processed structure (d′) and a surface profile of the processed structure. The second measured data is analyzed by interpreting it using the first measured data to determine a thickness (d′1 or d′2) of at least one layer of the processed structure. This determined thickness is indicative of the quality of processing. |
申请公布号 |
US2012044506(A1) |
申请公布日期 |
2012.02.23 |
申请号 |
US201113270647 |
申请日期 |
2011.10.11 |
申请人 |
COHEN YOEL;FINAROV MOSHE;VINOKUR KLARA;NOVA MEASURING INSTRUMENTS LTD. |
发明人 |
COHEN YOEL;FINAROV MOSHE;VINOKUR KLARA |
分类号 |
G01B11/28;G01B11/06 |
主分类号 |
G01B11/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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