METHOD OF MANUFACTURING REFLECTIVE MASK BLANK HAVING PSEUDO PHASE DEFECT, AND METHOD OF MANUFACTURING REFLECTIVE MASK HAVING PSEUDO PHASE DEFECT

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a reflective mask blank having a pseudo phase defect and a method of manufacturing a reflective mask having a pseudo phase defect capable of forming several kinds of concave design defects with different depths and several kinds of convex design defects with different heights on the same substrate, without a complex process of performing a pattern formation and etching process a plurality of times depending on the number of kinds of depths or heights of the design defects.

SOLUTION: All patterns of several kinds of concave design defects with different depths and several kinds of convex design defects with different heights are collectively formed on a hard mask formed on a substrate using a positive resist process and a negative resist process once alternately. Thereafter, the substrate is sequentially etched while masking the hard mask pattern.

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