NANOIMPRINT MOLD MANUFACTURING METHOD AND RESIST PATTERN FORMATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a nanoimprint mold manufacturing method and a resist pattern formation method capable of preventing a resist pattern shape from deteriorating even in an atmosphere in which oxygen exists and forming a fine transfer pattern in means for improving dry etching resistance of a resist pattern via electron beam irradiation.

SOLUTION: A resist pattern formation method forms a resist pattern 2, forms a protection film 3 for protecting the resist from ozone ashing on the resist pattern, irradiates the resist pattern with electron beam 4 via the protection film in an atmosphere in which oxygen exists like in the air, and then forms the resist pattern where dry etching resistance is improved by removing the protection film.

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