发明名称 |
DEPOSITION SYSTEM WITH A ROTATING DRUM |
摘要 |
A deposition method comprises flowing a first gas into a metallization zone maintained at a first pressure. A second gas flows into a reaction zone maintained at a second pressure. The second pressure is less than the first pressure. A rotating drum includes at least one substrate mounted to a surface of the drum. The surface alternately passes through the metallization zone and passes through the reaction zone. A target is sputtered in the metallization zone to create a film on the at least one substrate. The film on the at least one substrate is reacted in the reaction zone.
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申请公布号 |
US2012045588(A1) |
申请公布日期 |
2012.02.23 |
申请号 |
US201113211884 |
申请日期 |
2011.08.17 |
申请人 |
DEVITO RICHARD;VAECO INC. |
发明人 |
DEVITO RICHARD |
分类号 |
C23C14/35;C23C14/04;C23C14/14;C23C14/34 |
主分类号 |
C23C14/35 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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