发明名称 MICROLENS ARRAY MANUFACTURING METHOD AND MICROLENS ARRAY
摘要 <p>A method for manufacturing a microlens array includes: a step (A) for forming, on one surface of a silicon substrate, an organic film layer which is to be a material layer of a microlens, and a resist layer which is for forming the shape of the microlens; and an etching step (C) for etching the resist layer and the organic film layer by providing a gas mixture containing etching gas and deposition gas, setting the pressure to 100 mTorr or more, and setting the bias power applied to the silicon substrate to 200 W or less.</p>
申请公布号 WO2012023402(A1) 申请公布日期 2012.02.23
申请号 WO2011JP67311 申请日期 2011.07.28
申请人 TOKYO ELECTRON LIMITED;YOSHIMURA, SHOTA;SASAKI, MASARU 发明人 YOSHIMURA, SHOTA;SASAKI, MASARU
分类号 G02B3/00;H01L21/3065;H01L27/14 主分类号 G02B3/00
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