发明名称 PROGRAMMABLE FETs USING Vt-SHIFT EFFECT AND METHODS OF MANUFACTURE
摘要 Programmable field effect transistors (FETs) are provided using high-k dielectric metal gate Vt shift effect and methods of manufacturing the same. The method of controlling Vt shift in a high-k dielectric metal gate structure includes applying a current to a gate contact of the high-k dielectric metal gate structure to raise a temperature of a metal forming a gate stack. The temperature is raised beyond a Vt shift temperature threshold for providing an on-state.
申请公布号 US2012043622(A1) 申请公布日期 2012.02.23
申请号 US20100858094 申请日期 2010.08.17
申请人 CARTIER EDUARD A.;LIANG QINGQING;LIANG YUE;WANG YANFENG;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CARTIER EDUARD A.;LIANG QINGQING;LIANG YUE;WANG YANFENG
分类号 H01L29/68;G06F9/45;H01L21/336 主分类号 H01L29/68
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