| 摘要 |
While an illumination optical system 2 is irradiating the surface of a contaminated standard wafer 110 with illumination light, this illumination light is scanned over the surface of the contaminated standard wafer 110, then detectors 31 to 34 of a detection optical system 3 each detect the light scattered from the surface of the contaminated standard wafer 110, next a predefined reference value in addition to detection results on the scattered light is used to calculate a compensation parameter “Comp” for detection sensitivity correction of photomultiplier tubes 331 to 334 of the detectors 31 to 34, and the compensation parameter “Comp” is separated into a time-varying deterioration parameter “P”, an optical characteristics parameter “Opt”, and a sensor characteristics parameter “Lr”, and correspondingly managed. This makes it easy to calibrate the detection sensitivity. |
