| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an anticorrosive member which is a member covered with a yttria-based film, can be used mainly as a plasma treatment apparatus member for manufacture of semiconductors and liquid crystals, has a smooth and dense surface, never contaminate treating objects due to generation of particles and metal impurities in plasma treatment, and is excellent in durability. <P>SOLUTION: In the anticorrosive member in which a yttria-based anticorrosive film is formed at least on the surface of a site, of a base material composed of a ceramic or a metal, exposed to a plasma or a corrosive gas, the anticorrosive film has a composition in which at least the surface layer contains yttria as a main component, and other parts contain ≥0.02 mass% and ≤10 mol% of one of tantalum pentoxide and niobium pentoxide with respect to 100 mol% of the yttria. <P>COPYRIGHT: (C)2012,JPO&INPIT |
