发明名称 BEAM SCATTERING LASER MONITOR
摘要 New systems for characterizing laser beams, using measurements performed on light which has been Rayleigh scattered from the beam. Different implementations are used for beam profiling, using images of the Rayleigh scattered light, and for laser beam power measurement, using the integrated Rayleigh scattered light. Both of these implementations can be applied to laser beams having high powers, since the measurements do not require insertion of any element into the beam itself, but rather depend on light scattered laterally from the passing beam. The measurements can thus be termed "non contact" measurements, in contrast to prior art methods which require an element inserted into the beam. The systems use Rayleigh scattering from the laser beam passing through ambient air, such that no special scattering chambers or liquids are required for the measurements. Special cancelation algorithms or filters are used to discriminate from light arising from scattering from dust particles.
申请公布号 WO2011119721(A3) 申请公布日期 2012.02.23
申请号 WO2011US29610 申请日期 2011.03.23
申请人 OPHIR-PHOTON LLC;GUTTMAN, JEFFREY L.;FLEISCHER, JOHN M.;MINSHALL, MARK E. 发明人 GUTTMAN, JEFFREY L.;FLEISCHER, JOHN M.;MINSHALL, MARK E.
分类号 G01J1/02;G01J1/22 主分类号 G01J1/02
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