发明名称 EVALUATION SUBSTRATE AND SUBSTRATE EVALUATION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate evaluation method by which a part where an insulation defect of a test pattern occurs, of an inner layer in a substrate in which test patterns are stacked into multiple layers. <P>SOLUTION: The present invention relates to a substrate in which multiple layers are stacked, including a test pattern layer in an inner layer. The test pattern layer includes a comb-shaped first test pattern, and a second test pattern with no branch arranged between first test patterns. A substrate evaluation method includes: a preparation step for preparing the substrate; a voltage application step for applying a voltage between the first test pattern and the second test pattern; and an evaluation step for evaluating an insulation property of the substrate. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012037314(A) 申请公布日期 2012.02.23
申请号 JP20100176126 申请日期 2010.08.05
申请人 FUJITSU LTD 发明人
分类号 G01R31/02;G01R31/12;H05K3/46 主分类号 G01R31/02
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