ATOMIC LAYER DEPOSITION METHOD FOR APPLYING BORON-CONTAINING FILMS

摘要

Triethylboron is a useful precursor for depositing films in an atomic layer deposition process. This precursor is useful for depositing boron containing films. Boron containing films are excellent lubricating coatings for zinc powders, improving their flow properties and simplifying powder handling. This makes the coated zinc powders especially useful for battery applications in which a zinc powder is used as an anode material.