摘要 |
<p>An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B2F4. Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.</p> |
申请人 |
ADVANCED TECHNOLOGY MATERIALS, INC.;KAIM, ROBERT;SWEENEY, JOSEPH, D.;BYL, OLEG;YEDAVE, SHARAD, N.;JONES, EDWARD, E.;ZOU, PENG;TANG, YING;CHAMBERS, BARRY, LEWIS;RAY, RICHARD, S. |
发明人 |
KAIM, ROBERT;SWEENEY, JOSEPH, D.;BYL, OLEG;YEDAVE, SHARAD, N.;JONES, EDWARD, E.;ZOU, PENG;TANG, YING;CHAMBERS, BARRY, LEWIS;RAY, RICHARD, S. |