| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a BiTi based oxide sputtering target which can stably perform sputtering even at a high output, and has reduced cracks, and a method for producing the same. <P>SOLUTION: The BiTi based oxide sputtering target contains a metal oxide phase including Bi and Ti, and has a thermal conductivity of ≥1.4 W/mk. Further, the method for producing the sputtering target includes: a step of pulverizing the oxide of Bi and the oxide of Ti and mixing them to produce mixed powder; a step of calcining the mixed powder so as to be calcined powder; a step of adding boron oxide of 1 to 9 mol% (0.4 to 3.6 at% expressed in terms of boron) to the calcined powder, and disintegrating and mixing the same so as to be added calcined powder; and a step of heating the added calcined powder in a vacuum or an inert gas atmosphere while applying pressure thereto, and performing sintering. <P>COPYRIGHT: (C)2012,JPO&INPIT |
