| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition capable of forming a chemically amplified resist film which effectively responds to electron beams or extreme ultraviolet rays and has excellent nano edge roughness, sensitivity, and resolution to stably produce a fine pattern with a high degree of accuracy, and to provide a polymer used therefor. <P>SOLUTION: A radiation sensitive resin composition contains a polymer which comprises at least one of the repeating units represented by the following formulas (I) and (II) and a (meth)acrylate unit having an acid-dissociable alicyclic group in a side chain. <P>COPYRIGHT: (C)2012,JPO&INPIT |
