发明名称 |
APPARATUS FOR AGITATING AND EVACUATING BYPRODUCT DUST FROM A SEMICONDUCTOR PROCESSING CHAMBER |
摘要 |
PURPOSE: An apparatus for sintering and eliminating by-product dust of a semiconductor process chamber is provided to effectively eliminate dust existing inside a pedestal well of the semiconductor process chamber. CONSTITUTION: Housing(305) is formed in order to cover a ring type gap of a pedestal well of a processing chamber. The housing comprises a plurality of viewports(335). An inflow port(325) comprises a three ways valve which is combined in a individual selection switch(330). One or more vacuum ports(320) is combined in each vacuum hose. Each vacuum hose is combined in a single vacuum source. One and more cleaning nozzles are formed in order to inject gas in the inner side of the pedestal well. The housing stores a by-product which is sintered by the gas.
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申请公布号 |
KR20120015995(A) |
申请公布日期 |
2012.02.22 |
申请号 |
KR20110060781 |
申请日期 |
2011.06.22 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
MCCORMICK ERIC;MAY BRADLEY;MENDEZ ROLANDO |
分类号 |
H01L21/205;H01L21/02 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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