发明名称 APPARATUS FOR AGITATING AND EVACUATING BYPRODUCT DUST FROM A SEMICONDUCTOR PROCESSING CHAMBER
摘要 PURPOSE: An apparatus for sintering and eliminating by-product dust of a semiconductor process chamber is provided to effectively eliminate dust existing inside a pedestal well of the semiconductor process chamber. CONSTITUTION: Housing(305) is formed in order to cover a ring type gap of a pedestal well of a processing chamber. The housing comprises a plurality of viewports(335). An inflow port(325) comprises a three ways valve which is combined in a individual selection switch(330). One or more vacuum ports(320) is combined in each vacuum hose. Each vacuum hose is combined in a single vacuum source. One and more cleaning nozzles are formed in order to inject gas in the inner side of the pedestal well. The housing stores a by-product which is sintered by the gas.
申请公布号 KR20120015995(A) 申请公布日期 2012.02.22
申请号 KR20110060781 申请日期 2011.06.22
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 MCCORMICK ERIC;MAY BRADLEY;MENDEZ ROLANDO
分类号 H01L21/205;H01L21/02 主分类号 H01L21/205
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