Method of forming semiconductor thin film and method of fabricating solar cell

摘要

A silicon thin film is formed by coating on a substrate a solution of polysilane represented by the general formula -(SiR12)n-, where R1 substituents are selected from the group consisting of hydrogen, an alkyl group having two or more carbon atoms and a beta -hydrogen, a phenyl group and a silyl group, and thermally decomposing the polysilane to deposit silicon.