APPARATUS FOR PROCESSING SUBSTRATE

摘要

PURPOSE: A substrate processing apparatus is provided to minimize an amount of contaminants which is able to be attached to a substrate by effectively exhausting fume. CONSTITUTION: A processing chamber(700) provides a space performing a substrate processing process. A spin head(200) is installed in the processing chamber and supports a substrate(w). A treatment basin(100) provides a processing space for treating the substrate. An injecting member(300) sprays drug solution to the top of the substrate which is placed on the spin head. A sealing member seals an upper space of the treatment basin within the processing chamber. A bottom sealing basin protects the outer circumferential side of the treatment basin. An elevating member transfers the bottom sealing basin to top and bottom directions.