| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a process for selectively depositing a graphite nanofiber thin film used for a carbon based electron emission source. SOLUTION: The substrate to be treated obtained by depositing a thin film of Fe, Co or an alloy containing at least one kind of those metals in prescribed patterns on a glass substrate or an Si substrate is placed in an evacuated vacuum chamber, and is heated, thereafter, a carbon-containing gas and gaseous hydrogen are introduced into the chamber, the pressure in the chamber is kept at about 1 atm., and graphite nanofiber is uniformly grown only on the pattern parts on the substrate by a thermal CVD process.</p> |
