| 摘要 |
A sputtering target which can be applied to the DC sputtering method, used for stably forming a transparent conductive film having a resistivity of 10<-2> to 10<10> OMEGA .cm, and is made of an oxide containing Zn, Al, and Y, and a transparent conductive film which has a resistivity of 10<-2> to 10<10> OMEGA .cm and a low light absorption factor, and is made of an oxide containing Zn, Al, and Y are disclosed.
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