发明名称 Method for forming and arrangement of barrier layers on a polymeric substrate
摘要 The main subject of the invention is method for forming an arrangement of two ceramic barrier layers (5,10) on a polymeric substrate (1) which comprises the steps of: A) Applying a first ceramic barrier layer (5) on the substrate (1), B) modifying the surface (5A) of the first barrier layer (5) to introduce new nucleation sites on the surface of this first layer, C) forming a second ceramic barrier layer (10) on the first barrier layer (5) using the new nucleation sites. <??>The method of the invention allows the deposition of the second ceramic layer with independent nucleation sites so that a barrier stack of enhanced quality is formed. <IMAGE>
申请公布号 EP1466997(B1) 申请公布日期 2012.02.22
申请号 EP20030005270 申请日期 2003.03.10
申请人 OSRAM OPTO SEMICONDUCTORS GMBH 发明人 PAETZOLD, RALPH;GIERES, GUENTER;WITTMANN, GEORG;HENSELER, DEBORA;HEUSER, KARSTEN
分类号 B32B18/00;C23C14/08;B32B27/00;C23C14/06;C23C14/22;C23C16/30;C23C16/44 主分类号 B32B18/00
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