| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a large-size synthetic quartz glass substrate for exposure which is used for the manufacture of a liquid crystal panel, which suppresses dust from the peripheral face part of the substrate during cleaning and which can be manually handled. <P>SOLUTION: The large-size synthetic quartz glass substrate for exposure is of a plate shape having a diagonal length or diameter of≥500 mm, a thickness of 1-20 mm, and a peripheral surface with a roughness Ra having a chamfer of 0.05-0.4μm, in which the peripheral surface with a roughness is less than the chamfer surface with a roughness. According to the large-size synthetic quartz glass substrate for exposure of the present invention, the number of particles released from the substrate periphery during cleaning is minimized, leading to an improved yield in the cleaning step. The substrate can be manually handled, achieving an improvement in substrate quality without a need for a handling facility. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
