| 摘要 |
PURPOSE: An etchant composition is provided to embody rapid etching rate, to have excellent etching performance, and to keep etchant for long time. CONSTITUTION: An etchant composition for a metal layer with copper and titanium comprises persulfate, a fluorine-containing compound, inorganic acid, a cyclic amine compound, a chlorine-containing compound, copper salts, p-toluenesulfonic acid, and water. The persulfate is at least one selected from a group consisting of ammonium persulfate, sodium persulfate, and potassium persulfate. The fluorine-containing compound is at least one selected from a group consisting of ammonium fluoride, sodium fluoride, potassium fluoride, ammonium bifluoride, sodium bifluoride, and potassium bifluoride.
|
