发明名称 METHOD AND DEVICE FOR VAPOR-PHASE GROWTH
摘要 PROBLEM TO BE SOLVED: To provide a vapor-phase growth method of excellent crystallinity by improving control efficiency for the partial pressure of water content and oxygen. SOLUTION: A reactive chamber 13 which is, comprising a heating means 15, connected to first and second high-vacuum exhausting means 31 and 32, and at least first and second load lock chambers 11 and 12 wherein a substrate 1 for vapor-phase growth is carried into the reactive chamber 13 in vacuum condition, are provided. Here, with a third high-vacuum exhausting means 33 connected to the first load lock chamber 11, the reactive chamber 13 and the load lock chamber 11 are efficiently exhausted with additional high-vacuum exhausting means so that the water content and oxygen partial pressure are lowered sufficiently in a short time.
申请公布号 JP2000182966(A) 申请公布日期 2000.06.30
申请号 JP19980356517 申请日期 1998.12.15
申请人 SONY CORP;ULVAC JAPAN LTD 发明人 YAMAGATA HIDEO;KAWAMOTO TAKEYOSHI;TAKAHASHI SEIICHI;MIHASHI TETSUO;ASARI SHIN
分类号 H01L21/205;C23C16/44;C23C16/455;H01L21/203;H01L21/285;(IPC1-7):H01L21/205 主分类号 H01L21/205
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