发明名称 ION IMPLATING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an ion implating device capable of reducing metal pollution from a protection plate for protecting an inner wall of a beam passage. SOLUTION: A projected wall portion 28 vertically and substantially extending against the surface of a protection plate 27 and having a vertical wall surface 30 to which an unnecessary ion beam 11B is collided is continuously formed on the surface of a protection plate 27 along an extension direction of a beam passage. Thereby, when an unnecessary ion beam 11B is collided to a vertical wall surface 30 of a constitution particle of a wall surface generated accompanying with this is deposited on a surface of the protection plate 27 without flying toward the track of an ion beam 11A selected. Thereby, a metal pollution from the protection plate 27 can be reduced as compared with the conventional case.
申请公布号 JP2000285846(A) 申请公布日期 2000.10.13
申请号 JP19990088660 申请日期 1999.03.30
申请人 SONY CORP 发明人 KOHAMA HISAMASA
分类号 H01J37/16;C23C14/48;H01J37/317;H01L21/265;(IPC1-7):H01J37/317 主分类号 H01J37/16
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