| 摘要 |
PROBLEM TO BE SOLVED: To obtain an image having low fog and less liable to the rise of fog and a change in sensitivity in preservation before exposure and to obtain an image having high Dmax and few black spots and optimum for use in a photomechanical process by incorporating at least two specified compounds on the side with an image forming layer. SOLUTION: The heat developable photosensitive material contains a compound of formula I, a compound of the formula X11-(J)m(B1) (II), a polymer having repeating units of a monomer of the formula Q1-X12 (III) and a compound of the formula A1-X13 (IV) on the side with an image forming layer containing photosensitive silver halide. In the formula I, Z1 and Z2 are each halogen, X1 is H or an electron withdrawing group, Y1 is -CO- or -SO2-, Q is arylene or a divalent heterocyclic group, L is a combining group and W is carboxyl, sulfo or the like. In the formulae II-IV, X11-X13 are each the residue of a photographic inhibitor, J is a bonding group, B1 is a ballast group, Q1 is an ethylenically unsaturated group and A1 is a water-soluble group.
|
