发明名称 HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To obtain a heat developable photosensitive material having low fog, high sensitivity, high contrast, high blackening density (Dmax) and low Dmin in a UV region and less liable to a change in sensitivity and fog in preservation by forming an image forming layer containing photosensitive silver halide having a specified silver chloride content on a substrate and incorporating a specified compound on the side of the substrate with the image forming layer. SOLUTION: The heat developable photosensitive material has an image forming layer containing photosensitive silver halide having >=60 mol% silver chloride content on the substrate and contains at least one compound selected from substituted alkene derivatives of formula I, substituted isoxazole derivatives of formula II or acetal compounds of formula III on the side of the substrate with the image forming layer. In the formula I, R1-R3 are each H or a substituent and Z is an electron withdrawing group or silyl. In the formula II, R4 is a substituent. In the formula III, X and Y are each H or a substituent and A and B are each alkoxy, alkylthio, alkylamino or the like.
申请公布号 JP2000284401(A) 申请公布日期 2000.10.13
申请号 JP19990088495 申请日期 1999.03.30
申请人 FUJI PHOTO FILM CO LTD 发明人 ITO TADASHI
分类号 G03C1/498;(IPC1-7):G03C1/498 主分类号 G03C1/498
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