发明名称 |
Mask making decision for manufacturing (DFM) on mask quality control |
摘要 |
The present disclosure provide a method for making a mask. The method includes assigning a plurality of pattern features to different data types; writing the plurality of pattern features on a mask; inspecting the plurality of pattern features with different inspection sensitivities according to assigned data types; and repairing the plurality of pattern features on the mask according to the inspecting of the plurality of pattern features. |
申请公布号 |
US8120767(B2) |
申请公布日期 |
2012.02.21 |
申请号 |
US20080048043 |
申请日期 |
2008.03.13 |
申请人 |
TU CHIH-CHIANG;HUANG CHIEN-CHAO;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
TU CHIH-CHIANG;HUANG CHIEN-CHAO |
分类号 |
G01N21/00;G06K9/00 |
主分类号 |
G01N21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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