发明名称 Exposure apparatus and method of manufacturing device
摘要 When a substrate stage is located in a first area, a first measurement device measures the same portion of the substrate at the plural measurement points both before and after the stage is horizontally driven. A controller calculates a first difference of the stage in the vertical direction in the first area accompanying driving of the stage horizontally, based on a first measurement result, calculates a value representing a surface shape of the substrate by subtracting the first difference from the first measurement result, calculates a second difference of the stage in the vertical direction in the second area accompanying driving of the stage horizontally by subtracting the value from a value representing a vertical position of the substrate when the stage is located in the second area, and controls a vertical position of the stage in the second area based on the second difference.
申请公布号 US8120750(B2) 申请公布日期 2012.02.21
申请号 US20090482797 申请日期 2009.06.11
申请人 CANON KABUSHIKI KAISHA 发明人 HATTORI TADASHI
分类号 G03B27/42;G03B27/52 主分类号 G03B27/42
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