发明名称 Line structure and method for manufacturing the same
摘要 A line structure is provided which includes a ferroelectric film which is formed on at least one surface of both sides of a substrate and a permittivity of which changes according to a magnitude of an applied voltage, an inductor which is formed on a first side of the substrate, and a capacitor which has a capacitance corresponding to the permittivity of the ferroelectric film and the substrate.
申请公布号 US8120534(B2) 申请公布日期 2012.02.21
申请号 US20080042402 申请日期 2008.03.05
申请人 PARK EUN-SEOK;LEE JEONG-HAE;KIM YOUNG-EIL;KIM JONG-SEOK;YOON ICK-JAE;RYU YOUNG-HO;PARK JAE-HYUN;SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK EUN-SEOK;LEE JEONG-HAE;KIM YOUNG-EIL;KIM JONG-SEOK;YOON ICK-JAE;RYU YOUNG-HO;PARK JAE-HYUN
分类号 H01Q1/38 主分类号 H01Q1/38
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