| 摘要 |
PURPOSE: An apparatus and method for cleaning a substrate are provided to improve the drying efficiency of a substrate by maintaining the temperature of a substrate for a drying process to be over preset temperature. CONSTITUTION: A rotatable substrate support member(310) supports a substrate. A cleaning liquid supply member(340) supplies cleaning liquid to an upper side of the substrate. A first fluid supply member(350) supplies a first fluid, which is heated at higher temperature than room temperature, to a bottom side of the substrate. A second fluid supply member(360) supplies a second fluid to the upper side of the substrate. The flux of the second fluid is different along a longitudinal direction of a second fluid supply nozzle(361).
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